DUBLIN–(BUSINESS WIRE)–The “Global Photolithography Equipment Market, By Type (EUV, DUV, I-line, ArF, ArFi, KrF), By Wavelength, By Device Wavelength, By End-Use, By Application, By Region, Competition, Forecast & Opportunities, 2026” report has been added to ResearchAndMarkets.com’s offering.

The Global Photolithography Equipment Market is expected to reach USD18.51 billion by 2026, growing at a CAGR of 8.56% owing to the rapid technological advancements and growing demand from the semiconductor market.

The increasing digitization in all sectors around the world, rising number of smartphones and evolving business models are creating numerous growth opportunities for the Global Photolithography Equipment Market. The industries are progressively receiving diverse types of photolithography equipments specified typically for each use, with growing technology requirements, for example, EUV, DUV, I-Line, ArF, ArFi, KrF.

The Global Photolithography Equipment Market can be segmented based on the type, wavelength, device wavelength, end-use, application, region and company. Based on type, the market can be segmented into EUV, DUV, I-Line, ArF, ArFi, and Kr. EUV is expected to lead the market owing to its increasing demand from the semiconductor industry as EUV chips are the most preferred due to their precision.

Based on wavelength, photolithography equipment can be divided into 370nm-270nm, 270nm-170nm, 170nm-1nm. The 170nm-1nm segment of the Global Photolithography Equipment Market is projected to grow at the highest CAGR during the forecast period. This wavelength is used to produce negative AND (NAND) logic gates and dynamic random-access memory (DRAM). It allows semiconductor manufacturers to produce memory chips at low costs. Among different types of photolithography equipment used, EUV majorly uses this wavelength to manufacture semiconductor devices.

Based on light sources, the Global Photolithography Equipment Market has been classified into mercury lamps, excimer lasers, fluorine lasers, and laser-produced plasmas. The booming market for EUV photolithography equipment drives the demand for laser-produced plasma light sources. Laser-produced plasmas are preferred in newly inaugurated EUV photolithography equipment because they offer highly improved wavelengths of up to 1 nm.

ASML, Canon, Nikon, EV Group, Global Foundries, and Eulithia AG are some of the leading players which are operating in the Global Photolithography Equipment Market. ASML here plays a role of a monopoly market contributing to the highest share of 91.6% in the market with its major customers being Samsung, Intel, and TSMC. ASML has been the key market player for the past 10 years and is expected to lead the market in the future as well on account of its high reliability and importer satisfaction.

These companies are launching highly reliable photolithography techniques with progressive instruction sets, technologically advanced light beam techniques with high frequency, accuracy, and precision. The companies operating in the market are using organic strategies such as new product launches and merges & collaborations to boost their shares in the market and meet consumer demands.

Companies Mentioned

ASML Holding N.V.

Canon Inc.

Eolith AG

EV Group

GlobalFoundries Inc.

Years considered for this report:

Historical Years: 2016-2019

Base Year: 2020

Estimated Year: 2021

Forecast Period: 2022-2026

Key Target Audience:

Photolithography equipment technology solution providers

End-Uses of the Global Photolithography Equipment Market (Front-End and Back-End)

Associations, organizations, forums, and alliances associated with the Global Photolithography Equipment Market based technology platforms and start-ups

Government bodies such as regulating authorities and policy makers

Research & development organizations and consulting firms

Report Scope:

Global Photolithography Equipment Market, By Type:

EUV

DUV

I-line

ArF

ArFi

KrF

Global Photolithography Equipment Market, By Wavelength:

370nm-270nm

270nm-170nm

170nm-1nm

Global Photolithography Equipment Market, By Device Wavelength:

Mercury Lamps

Flourine Lamps

Excimer Lasers

Lased Produced Plasma

Global Photolithography Equipment Market, By End-Use:

IDMs

Foundries

Global Photolithography Equipment Market, By Application:

Front End

Back End

Global Photolithography Equipment Market, By Region:

Asia-Pacific

China

India

Japan

South Korea

Singapore

Europe

France

Germany

Italy

Spain

United Kingdom

North America

United States

Canada

Mexico

Middle East & Africa

Saudi Arabia

UAE

South Africa

South America

Argentina

Columbia

Brazil

For more information about this report visit https://www.researchandmarkets.com/r/mmrsvi